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Latest articles
- Application of Wear-Resistant Alumina Ceramic Lined Engineering Equipment
- Advanced Ballistic Ceramic Materials:Properties and Applications of Alumina, Silicon Carbide, and Silicon Nitride
- Wear-Resistant Alumina Ceramic Perforated Plate (Holed Lining Brick): Technical Specifications and Industrial Applications
- Pingxiang Chemshun Ceramics Provides Customizable Shapes of Wear-Resistant Alumina Ceramic Liners
- Chemshun 2026 Chinese New Year Holiday Notice
- Wear-Resistant Alumina Ceramic Lined Pipe: The Core of Industrial Wear Solutions
- Ceramic Drum Lagging: The High-Performance Solution for Extreme Conditions
- 99.7% Alumina Ceramic Grinding Disc: High-Precision Grinding Solution
- Alumina Ceramic Liners: A Reliable Anti-Wear Solution for Mill Equipment
- Alumina Ceramic Grinding Balls: High-Performance Grinding Media
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Alumina Ceramics Wafer Polishing Plate for Chemical Mechanical Polishing (CMP)
Ceramic wafer polishing plate is a stage made of alumina ceramic materials. Alumina ceramics have excellent resistance to high temperature, wear and corrosion, so they are used as wafer bonding plates in polishing processes.
CHEMSHUN's alumina ceramic wafer polishing plates are usually made of high purity alumina ceramic powder by PIBM self-solidification process. Its main features include:
Excellent high temperature resistance: alumina ceramic plate can be used for a long time in high temperature environment.
Good wear resistance: alumina ceramic plate can be used in high-friction environments to reduce wear and debris generation.
Corrosion resistance: It can be used stably in acid and alkali polishing fluid environment for a long time.
High precision: with mature ceramic plate manufacturing process, can be customized according to customer requirements, high precision, can meet the requirements of different equipment include LED,SiC,Si...
Pingxiang Chemshun Ceramics' High Purity 99.7% Alumina Ceramic Sapphire Lapping wafer Polishing plate as an important component of CMP chemical mechanical polishing process. CMP is the necessary for producing process of the sapphire and Wafer. Because of the high purity alumina ceramics polishing plate excellent working performance, it is replacing the Metal wafer polishing plate.
